University of Central Florida partners with Powerlase

October 11--The partnership in the field of Extreme Ultraviolet lithography will further the development of high-power laser produced plasma EUV sources.

October 11--Powerlase Ltd has announced a partnership with the University of Central Florida (UCF) in the field of Extreme Ultraviolet (EUV) lithography to further the development of high-power laser produced plasma EUV sources.

EUV lithography is now the most promising technology for producing semiconductors of 32nmhp and below. The EUV source that both Powerlase and UCF are working on is based on the laser produced plasma approach. Through this relationship, Powerlase and UCF will demonstrate, to the EUV community, the potential of this collaborative work with regard to the production of high conversion efficiency, cost effective laser produced plasma EUV sources.

Powerlase has already provided UCF with its kilo-class Starlase laser to irradiate the UCF's tin-doped micro-droplet laser plasma source. This source has demonstrated the highest conversion efficiency with a minimum amount of contamination. The combination of a high EUV conversion efficiency and the elimination of neutral and charged particles is the aim of this collaborative work.

For more information, visit www.powerlase.com.

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