October 9--The Extreme Ultraviolet Lithography System Development Association (EUVA) in Japan has purchased Starlase lasers. The lasers will be used to further the research and development specialist's findings in the field of extreme ultraviolet (EUV) sources.
EUV lithography is reportedly the most promising technology for producing semiconductors of 32 nmhp and below. The EUVA will use the Powerlase lasers to develop new EUV sources for lithography steppers, which are to be used in semiconductor chip fabrication research, by generating 13.5nm extreme ultraviolet radiation as a source. Powerlase Starlase lasers has been selected as a research instrument to produce the high power, high-repetition laser, necessary to produce best-in-class results.