Nanoimprint lithography process for high-volume manufacturing

EV Group (EVG) has introduced its SmartNIL large-area nanoimprint lithography (NIL) process.

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St. Florian, Austria - EV Group (EVG) has introduced its SmartNIL large-area nanoimprint lithography (NIL) process. Available on all of the company's NIL platforms, the process provides a low-cost, large-area, and high-volume-manufacturing solution for a variety of advanced devices, including photonic-based devices such as LEDs, lasers, and photovoltaics; microarrays and nano-devices for medical devices and bioengineered applications; and advanced storage media, including newly emerging forms of non-volatile memory (NVM).

Features include a large full-field imprint area (up to 200mm), processing of >40 substrates/hr for 200mm substrates, and integrated soft stamp fabrication technology to reduce tool footprint and provide replication in less than 10 min. Self-cleaning properties reduce particle contamination and improve overall processing yields, while a room-temperature process avoids thermal mismatch and long-range structure distortion for improved alignment accuracy. Patterning on highly topographical structures is also possible.

For more information, please visit www.evgroup.com.

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