Oyama, Japan - Lithography light source maker Gigaphoton has achieved continuous operation of a 140W extreme ultraviolet (EUV) light source at 50-percent duty cycle on its prototype laser-produced plasma (LPP) light sources for EUV lithography scanners. It is widely believed that 140W is the output power required by EUV light sources for mass production applications.
Related: Gigaphoton achieves 92W EUV light source output at 4.2 percent CE
This achievement was a result of further advancements in key technologies developed by the company, such as droplet generators capable of producing tin (Sn) droplets smaller than 20μm in diameter; the single-wavelength, solid-state pre-pulse and main-pulse CO2 laser; and the debris mitigation technology using high-output superconducting magnets and Sn etching. The achievement of 140W continuous operation output at 50-percent duty cycle symbolizes that the industry is close to its final stages in realizing mass production-capable EUV scanners.
The company is continuing its R&D efforts and aims to achieve 250W output by the end of 2015.