Pittsburgh, PA - Aerotech’s PlanarDL-series stages offer good geometric and dynamic performance in a compact and low-profile package. Available in nine different travel and performance configurations, this stage is useful for applications ranging from high-accuracy surface profilometry to high-speed semiconductor and LED wafer scribing.
The PlanarDL XY design allows for planar geometric performance in applications where straightness and flatness of motion are critical. The stages have high-precision, anti-creep crossed-roller bearings, precision-machined surfaces, and Aerotech linear motors. At the heart of the PlanarDL is Aerotech’s proprietary direct-drive technology.
PlanarDL structural elements are optimized for high-dynamics and high-stiffness. Capable of achieving 1 m/s velocities and 1.5 g accelerations, the PlanarDL enables high-throughput, high-accuracy processing. The anti-creep crossed-roller bearings used in this design provide the smooth motion useful for the most challenging scanning applications.
The PlanarDL-200XY and -300XY stages are both available with one or two motors per axis, allowing optimization of each individual axis for the specific application and process parameters. Regardless of the number of motors selected, the resulting drive force acts through the centers of friction and stiffness resulting in superior geometric performance and accuracy.
The cable management system on the PlanarDL is integrated into the stage and optimized for long life and performance. Additional standard options are available for extra servo axes or air/vacuum lines for vacuum chucks or other process pneumatics.
The PlanarDL is available in three positioning performance options: -BASE, -PLUS and -ULTRA. Relying upon decades of experience in system-level design including not only positioning mechanics, but also software and electronics, Aerotech has developed advanced technologies to push the envelope of precision. High-performance -PLUS and -ULTRA options are available to enable accuracies and straightness values down to ±400 nm and orthogonality down to 1 arc second.