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Sales are strong across multiple regions and orders are "robust," with particular emphasis on Tier 1 automakers and demand for high-power lasers.
New CO 2 optics from Laser Research Optics offer drop-in replacements for low-power lasers used in plastics cutting applications.
Laser marking continues to gain popularity among jewelery desginers, offering a clean environmentally friendly process, flexibility for exquisite designs, and valuable identification methods.
Nutfield Technology, Hudson, NH, has simplified the software interface for its 3XB Series 3-axis scan heads, used in 2D and 3D laser scanning applications, to make it more ideal for precise 3D marking and engraving on curved, contoured surfaces.
Chinese firm Eastern Laser's ETC-1390 system for laser cutting wood incorporates a domestic-made 70 W CO 2 laser with two laser heads.
A pair of new products targets laser marking and engraving and laser cutting: a laser cutting table, and a more durable aluminum metal die sheet.
LPKF Laser & Electronics, Tualatin, OR, has introduced the ProtoLaser U3 laser, a small UV laser system that can be used in a wide breadth of applications and process a wide variety of material substrates.
Jens Gottmann, Martin Hermans, Maren Hörstmann-Jungemann, and Dagmar Schaefer Process produces microchannels and shaped holes With the new In-volume Selective Laser Etching (ISLE) technique, the Fraunhofer Institute for Laser Technology (ILT), in cooperation with the Chair for Laser Technology
Luneburg, Germany – On May 4, 2012 for the first time, the German laser system manufacturer of laser material processing systems ,eurolaser, will be welcoming visitors to its Laser-Fair and opening its doors to international customers and other guests. The day will be devoted to presenting all
St. Charles. MO and Chemnitz, Germany - During the manufacturing process of an Organic Light Emitting Diode (OLED) the different thin film layers needs to be structured. Up to now mechanical or wet chemical technologies were used. A new and innovative solution for structuring these thin films is