Powerlase announces research collaboration

February 21--Powerlase has announced a research collaboration with University College Dublin (UCD) that will further the development of Laser Produced Plasma (LPP) as an Extreme Ultraviolet (EUV) lithography light source.

The aim of the research is to provide the industry with a proven, robust, and cost effective laser product capable of providing a suitable light source for use in EUV lithography. Researchers from UCD will use vacuum equipment, which has been provided by Powerlase, to conduct a study of ion-emissions of the LPP EUV source. The LPP EUV approach reportedly is now the most promising technology for the high-volume manufacture of semiconductors at 32nm and below.

The latest development follows Powerlase' previously reported research collaborations in EUV lithography with the Extreme Ultravioltew Lithography Association in Japan and leading US academics at the University of Central Florida.

Get All the Industrial Laser Solutions News Delivered to Your Inbox

Subscribe to Industrial Laser Solutions Magazine or email newsletter today at no cost and receive the latest news and information.

 Subscribe Now
ILS Blogs
David Belforte
David Beleforte

Let's grow LME

Mon Apr 22 08:51:00 CDT 2013

Looked at manufacturing lately?

Wed Mar 20 09:57:00 CDT 2013

Industrial laser market meets forecast

Fri Mar 08 10:59:00 CST 2013

Photonics West features ultra-fast and fiber lasers

Mon Feb 18 13:31:00 CST 2013

Follow us at Join us on

Twitter - Industrial Laser Solutions

See Article Archive

View Industrial Laser Solutions past articles.

Copyright © 2007-2016. PennWell Corporation, Tulsa, OK. All Rights Reserved.PRIVACY POLICY | TERMS AND CONDITIONS